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    Optimized silicon (Si) nanowaveguide cladding enhances chip-to-fiber optical coupling. This graded-index multilayer film achieves near 90% efficiency while maintaining light confinement for Si nanowaveguides.

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    Area of Science:

    • Photonics
    • Materials Science
    • Nanotechnology

    Background:

    • Silicon nanowaveguides are crucial for integrated photonics.
    • Efficient coupling between nanowaveguides and optical fibers is a key challenge.
    • Existing methods often struggle with high coupling efficiency and light confinement.

    Purpose of the Study:

    • To design and optimize a graded-index multilayer thin-film stack.
    • To serve as both a cladding layer for silicon nanowaveguides and a collimator for chip coupling.
    • To achieve high optical coupling efficiency to standard single-mode fibers.

    Main Methods:

    • Numerical optimization of a graded-index profile (2.35 to 1.45).
    • Material realization using inductively coupled plasma chemical vapor deposition.
    • Fabrication of a silicon nitride (SiNx) cladded silicon waveguide.

    Main Results:

    • An optimized graded-index profile was determined.
    • Numerical simulations predicted coupling efficiency close to 90%.
    • The design successfully retained tight light confinement within the silicon nanowaveguide.

    Conclusions:

    • A graded-index multilayer thin-film stack can effectively function as both cladding and collimator.
    • The demonstrated SiNx cladded Si waveguide shows promise for efficient chip-to-fiber optical coupling.
    • This approach offers a viable solution for improving optical interconnects in integrated photonic devices.