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Engineering Surfaces through Sequential Stop-Flow Photopatterning
Christian W Pester1,2, Benjaporn Narupai1,3, Kaila M Mattson1,3
1Materials Research Laboratory (MRL), University of California, Santa Barbara, Santa Barbara, CA, 93106, USA.
Advanced Materials (Deerfield Beach, Fla.)
|September 13, 2016
Abstract:
Solution-exchange lithography is a new modular approach to engineer surfaces via sequential photopatterning. An array of lenses reduces features on an inkjet-printed photomask and reproduces arbitrarily complex patterns onto surfaces. In situ exchange of solutions allows successive photochemical reactions without moving the substrate and affords access to hierarchically patterned substrates.
