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Formation and Dynamics of Electron-Irradiation-Induced Defects in Hexagonal Boron Nitride at Elevated Temperatures
Thang Pham1,2,3,4, Ashley L Gibb1,5,3,4, Zhenglu Li1,3
1Department of Physics, University of California , Berkeley, California 94720, United States.
Abstract:
The atomic structure, stability, and dynamics of defects in hexagonal boron nitride (h-BN) are investigated using an aberration-corrected transmission electron microscope operated at 80 kV between room temperature and 1000 °C. At temperatures above 700 °C, parallelogram- and hexagon-shaped defects with zigzag edges become prominent, in contrast to the triangular defects typically observed at lower temperatures. The appearance of 120° corners at defect vertices indicates the coexistence of both N- and B-terminated zigzag edges in the same defect. In situ dynamics studies show that the hexagonal holes grow by electron-induced sputtering of B-N chains, and that at high temperatures these chains can migrate from one defect corner to another. We complement the experiments with first-principles calculation which consider the thermal equilibrium formation energy of different defect configurations. It is shown that, below a critical defect size, hexagonal defects have the lowest formation energy and therefore are the more-stable configuration, and triangular defects are energetically metastable but can be "frozen in" under experimental conditions. We also discuss the possible contributions of several dynamic processes to the temperature-dependent defect formation.
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