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Site-Selective Plasmonic Etching of Silver Nanocubes
Koichiro Saito1, Ichiro Tanabe1, Tetsu Tatsuma1
1Institute of Industrial Science, The University of Tokyo , 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan.
The Journal of Physical Chemistry Letters
|November 4, 2016
Summary
Plasmon-induced charge separation enables site-selective nanoetching of silver nanocubes on TiO2. This technique utilizes specific resonance modes for precise etching beyond the diffraction limit.
Area of Science:
- Nanophotonics
- Materials Science
- Surface Chemistry
Background:
- Plasmon-induced charge separation (PICS) is crucial for photovoltaics and photocatalysis.
- Controlling nanoscale phenomena at interfaces is key for advanced applications.
Purpose of the Study:
- To achieve site-selective nanoetching of silver nanocubes on TiO2 using PICS.
- To investigate the role of plasmonic resonance modes in directing etching.
- To understand the mechanism of PICS-driven nanoetching.
Main Methods:
- Utilizing silver nanocubes on TiO2 substrates.
- Exploiting distal and proximal plasmonic resonance modes for selective etching.
- Employing PICS for nanophotonic etching beyond the diffraction limit.
Main Results:
- Achieved site-selective nanoetching at the top and bottom of silver nanocubes.
- Demonstrated PICS-driven etching is induced by the plasmonic near field via an external photoelectric effect.
- Explained distal mode etching by energetic electron ejection from the nanocube to TiO2.
Conclusions:
- PICS can be precisely controlled for site-selective nanoetching.
- The plasmonic near field is the driving force for the anodic reaction in PICS.
- Energetic electrons play a key role in the etching process at specific plasmonic modes.
