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Updated: Mar 13, 2026

Fabrication of Large-area Free-standing Ultrathin Polymer Films

Fabrication of Large-area Free-standing Ultrathin Polymer Films

Published on: June 3, 2015

Recent progress of atomic layer deposition on polymeric materials.

Hong Chen Guo¹, Enyi Ye¹, Zibiao Li¹

¹Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, Innovis, #08-03, Singapore 138634, Singapore.

Materials Science & Engineering. C, Materials for Biological Applications

|October 25, 2016

Summary

Atomic Layer Deposition (ALD) offers promising surface modification for polymers. This review explores ALD on polymers, detailing surface chemistry and reaction mechanisms for advanced applications.

Keywords:

Atomic layer deposition Inorganic/polymer interfaces Polymeric materials Surface chemistry Thin films

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Area of Science:

Materials Science
Surface Chemistry
Polymer Science

Background:

Atomic Layer Deposition (ALD) is a key surface coating technology.
ALD modifies polymeric material surfaces to enhance functions and applications.
Polymeric materials present unique challenges for ALD due to variations in surface chemistry and structure.

Purpose of the Study:

To provide a comprehensive review of ALD on polymeric materials.
To deepen the understanding of surface chemistry and reaction mechanisms in ALD on polymers.
To guide the development of improved ALD processes for polymers.

Main Methods:

Literature review of existing research on ALD applied to polymers.
Analysis of surface chemistry and reaction mechanisms.
Exploration of ALD deposition conditions tailored for polymeric substrates.

Main Results:

ALD enables controlled surface modification of diverse polymeric materials.
Understanding reaction mechanisms is crucial for successful ALD on polymers.
ALD facilitates integration of inorganic/organic films on polymers.

Conclusions:

ALD is a versatile technique for advanced polymer surface engineering.
Further research into precursor-polymer interactions can unlock new applications.
This review provides a foundation for optimizing ALD processes on polymers.