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X-ray reflectometer for single layer and multilayer coating characterization at 8 keV: An interlaboratory study.
Danielle N Gurgew1, David M Broadway2, Mikhail Gubarev2
1Department of Physics, The University of Alabama in Huntsville, Huntsville, Alabama 35899, USA.
A new X-ray reflectometer (XRR) system was developed for analyzing X-ray optic coatings. Interlaboratory studies confirmed its accuracy in reflectivity measurements, ensuring reliable characterization of optical materials.
Area of Science:
- Materials Science
- Optics
- Instrumentation
Background:
- Characterizing X-ray optic coatings is crucial for advanced optical systems.
- Existing methods may have limitations in precision and versatility.
- The need for a reliable system for soft and hard X-ray applications.
Purpose of the Study:
- To develop and describe a novel X-ray reflectometer (XRR) system.
- To detail the design, capabilities, and operational parameters of the XRR instrument.
- To validate the system's performance through interlaboratory comparisons.
Main Methods:
- Utilized a high-output rotating anode source (RAS) with a copper target.
- Employed precision slits for beam collimation and resolution control.
- Incorporated a goniometer with rotary stages and a silicon drift detector for precise measurements.
Main Results:
- The XRR system successfully generated X-ray radiation and isolated the Cu Kα line.
- System parameters were optimized for reflectivity measurements across various grazing angles.
- Interlaboratory study demonstrated comparable reflectivity measurements with external labs.
Conclusions:
- The developed XRR system is capable of accurately characterizing soft and hard X-ray optic coatings.
- The system's performance is validated by its agreement with external laboratory measurements.
- This instrument provides a reliable tool for advancing X-ray optics research and development.

