X-ray reflectometer for single layer and multilayer coating characterization at 8 keV: An interlaboratory study.

Area of Science:

• Materials Science
• Optics
• Instrumentation

Background:

• Characterizing X-ray optic coatings is crucial for advanced optical systems.
• Existing methods may have limitations in precision and versatility.
• The need for a reliable system for soft and hard X-ray applications.

Purpose of the Study:

• To develop and describe a novel X-ray reflectometer (XRR) system.
• To detail the design, capabilities, and operational parameters of the XRR instrument.
• To validate the system's performance through interlaboratory comparisons.

Main Methods:

• Utilized a high-output rotating anode source (RAS) with a copper target.
• Employed precision slits for beam collimation and resolution control.
• Incorporated a goniometer with rotary stages and a silicon drift detector for precise measurements.

Main Results:

• The XRR system successfully generated X-ray radiation and isolated the Cu Kα line.
• System parameters were optimized for reflectivity measurements across various grazing angles.
• Interlaboratory study demonstrated comparable reflectivity measurements with external labs.

Conclusions:

• The developed XRR system is capable of accurately characterizing soft and hard X-ray optic coatings.
• The system's performance is validated by its agreement with external laboratory measurements.
• This instrument provides a reliable tool for advancing X-ray optics research and development.