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    Area of Science:

    • Integrated photonics
    • Quantum optics
    • Nanofabrication

    Background:

    • Manufacturing imperfections in integrated photonics limit device performance, especially in interferometric architectures.
    • These limitations critically impact advancements in photonics and quantum photonic technologies.

    Purpose of the Study:

    • To demonstrate an ultrahigh extinction ratio silicon photonic device overcoming fabrication imperfections.
    • To showcase the potential of active optimization for precise control of linear-optical components.

    Main Methods:

    • Fabrication of a silicon photonic device with cascaded Mach-Zehnder interferometers.
    • Integration of additional interferometers as variable beamsplitters.
    • Application of an automated progressive optimization algorithm for real-time compensation of imperfections without pre-calibration.

    Main Results:

    • Achieved an ultrahigh extinction ratio exceeding 60 dB in the silicon photonic device.
    • Successfully compensated for imperfections in fabricated beamsplitters using the automated algorithm.
    • Demonstrated accurate control over linear-optical components.

    Conclusions:

    • The developed approach overcomes manufacturing limitations in integrated photonics.
    • This technology enables precise control of optical components for scalable quantum information processing.
    • The findings pave the way for advanced photonic applications requiring high-fidelity optical control.