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    Area of Science:

    • Plasmonics
    • Nanotechnology
    • Optical Engineering

    Background:

    • Plasmonic structures are essential for manipulating light at the nanoscale.
    • Confining optical fields to sub-wavelength dimensions is critical for advanced applications.

    Purpose of the Study:

    • To report a new plasmonic nanoscale ridge aperture.
    • To present a fabrication process based on layer-by-layer planar lithography.
    • To demonstrate sub-wavelength confinement of near-field spots.

    Main Methods:

    • Layer-by-layer planar lithography for fabrication.
    • Finite Element Method (FEM) for numerical simulations of near-field distribution.
    • Scattering near-field scanning optical microscopy (s-NSOM) for experimental validation.

    Main Results:

    • Successful fabrication of a plasmonic nanoscale ridge aperture.
    • Numerical simulations predicted confined near-field spots.
    • Experimental measurements confirmed the generation of focused spots in the ridge gap.

    Conclusions:

    • The developed fabrication process enables precise nanoscale feature creation.
    • The plasmonic aperture effectively confines near-field spots to sub-wavelength dimensions.
    • This technology is a step towards mass production for applications like heat-assisted magnetic recording (HAMR).