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Updated: Mar 11, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Screening of metal flux for SiC solution growth by a thin-film combinatorial method
Yoshiyuki Yonezawa1, Mina Ryo1, Aki Takigawa1
1Corporate R&D Headquarters, Fuji Electric Co., Ltd, 1, Fuji-machi, Hino-city, Tokyo, 191-8502, Japan.
Abstract:
4H-SiC is a wide-bandgap semiconductor with potential applications in power devices. The lack of a liquid phase in SiC hinders conventional crystal growth from the melt; consequently, SiC wafers still have low quality and are nearly 100 times more expensive than Si wafers. To take advantage of the solution growth for improving the quality and reducing the cost of SiC, Ni addition to Si-Ti flux has been investigated. A combinatorial approach was employed to accelerate the screening of metal flux for the SiC solution growth.
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