From evaporation-induced self-assembly to shear-induced alignment.

R Srikantharajah1, T Schindler2, I Landwehr3

  • 1Institute of Particle Technology, Friedrich-Alexander-Universität Erlangen-Nürnberg, Cauerstraße 4, 91058 Erlangen, Germany. wolfgang.peukert@fau.de.

Nanoscale
|November 24, 2016
PubMed
Summary

Achieve highly ordered nanostructured thin films by controlling competing evaporation-induced self-assembly (EISA) and shear-induced alignment (SIA) during dip coating. This study provides processing guidelines for enhanced film homogeneity and order.

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