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Related Concept Videos

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There are two main infrared (IR) spectrophotometers: dispersive IR spectrometers and Fourier transform infrared (FTIR) spectrometers. In a dispersive IR spectrometer, a beam of infrared radiation produced by a hot wire is divided into two parallel equal-intensity beams using mirrors. One beam passes through the sample, while another is a reference beam. The beams then move through the monochromator, which separates the radiations into a continuous spectrum of different frequencies. The...
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Attenuated total reflectance (ATR) infrared spectroscopy is a powerful analytical technique used to study the composition of materials. It is widely employed in chemistry, materials science, forensic science, and other fields where sample characterization is required. ATR has several advantages over traditional transmission IR spectroscopy, including the requirement of little to no sample preparation and the ability to analyze a wide range of samples.
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All-Silicon Ultra-Broadband Infrared Light Absorbers.

Kazim Gorgulu1, Abdullah Gok1, Mehmet Yilmaz2

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|December 8, 2016
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This summary is machine-generated.

Researchers developed silicon-based mid-infrared absorbers for thermal imaging and spectroscopy. These novel absorbers achieve ultra-broadband absorption using silicon gratings, enabling cost-effective fabrication for advanced applications.

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Area of Science:

  • Photonics and Materials Science
  • Nanotechnology and Microfabrication

Background:

  • Efficient infrared radiation absorption is crucial for thermal imaging and spectroscopy.
  • Existing infrared absorbers are often incompatible with standard Silicon Very Large Scale Integration (Si VLSI) technology.

Purpose of the Study:

  • To demonstrate ultra-broadband mid-infrared absorbers fabricated entirely from silicon.
  • To enable cost-effective, wafer-scale fabrication of infrared absorption micro-structures.

Main Methods:

  • Utilizing a combination of free carrier absorption, vibrational resonances, and plasmonic resonances.
  • Designing periodically arranged silicon gratings.
  • Employing standard optical lithography and deep reactive ion etching (DRIE) for fabrication.

Main Results:

  • Achieved ultra-broadband absorption exceeding 15 micrometers (5-20 μm) with over 90% average absorptivity.
  • Demonstrated robust absorption performance across a wide range of incidence angles (up to 50°).
  • Confirmed absorption performance is independent of polarization.

Conclusions:

  • Silicon-based gratings offer a promising solution for broadband mid-infrared absorption.
  • The developed fabrication methods allow for scalable and economical production of these absorbers.
  • These silicon absorbers are suitable for integration into Si VLSI technology for various infrared applications.