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Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications

Hyeon-Ho Jeong1, Andrew G Mark1, Tung-Chun Lee2

  • 1Max Planck Institute for Intelligent Systems Heisenbergstr. 3 70569 Stuttgart Germany.

Advanced Science (Weinheim, Baden-Wurttemberg, Germany)
|December 17, 2016
PubMed

Keywords:
block copolymer micelle nanolithographyglancing angle depositionnanoimprint lithographynanoparticle lithographyshadow growth physical vapor deposition

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