Phase shifting mask modulated laser patterning on graphene
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Optimized Fabrication Procedure for High-Quality Graphene-based Moiré Superlattice Devices
Published on: July 11, 2025
Fan Gao1,2, Fengyuan Liu2, Ziran Ye1
1Department of Applied Physics, College of Science, Zhejiang University of Technology, Hangzhou 310023, People's Republic of China.
Abstract:
A one-step graphene patterning method is developed in this paper. A phase shifting mask is used to modulate incident laser beam spatially and generate graphene patterns by laser heating. Periodic graphene nanoribbon and nanomesh structures are fabricated by employing 1D and 2D phase shifting masks, respectively. The noncontact, simple procedure, easy handling and economic properties of this method make it promising towards graphene-based device fabrication.

