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Related Concept Videos

P-N junction01:11

P-N junction

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A p-n junction is formed when p-type and n-type semiconductor materials are joined together. At the interface of the p-n junction, holes from the p-side and electrons from the n-side begin to diffuse into the opposite sides due to the concentration gradient. This diffusion of carriers leads to a region around the junction where there are no free charge carriers, known as the depletion region. The charge density within the depletion region for the n-side and p-side can be described by the...
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Digital Printing of Titanium Dioxide for Dye Sensitized Solar Cells
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Inkjet Printing NiO-Based p-Type Dye-Sensitized Solar Cells.

R Brisse1, R Faddoul1, T Bourgeteau1

  • 1Laboratory of Innovation in Surface Chemistry and Nanosciences (LICSEN), NIMBE, CEA, CNRS, Université Paris-Saclay , CEA Saclay, 91191 Gif-sur-Yvette, Cedex, France.

ACS Applied Materials & Interfaces
|December 28, 2016
PubMed
Summary

Researchers developed low-cost, inkjet-printed mesoporous nickel oxide (NiO) films for photovoltaic applications. Different thermal treatments created unique NiO structures, enhancing performance in dye-sensitized solar cells (p-DSSC).

Keywords:
dye-sensitized solar cellsinkjet printingmorphology controlnickel oxidesol−gel

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Electrochemistry

Background:

  • Transparent p-type semiconductors are crucial for scalable electronic devices, particularly in photovoltaic and photocatalytic applications.
  • Low-cost fabrication methods are needed to enable widespread use of these materials.

Purpose of the Study:

  • To investigate the inkjet printing of mesoporous nickel oxide (NiO) films for the first time.
  • To explore the effect of different thermal treatments on NiO film morphology and properties.
  • To evaluate the performance of these NiO films in a p-type dye-sensitized solar cell (p-DSSC) configuration.

Main Methods:

  • Sol-gel ink formulation using nickel chloride and Pluronic F-127 in a water/ethanol mixture.
  • Inkjet printing of multilayer NiO films using a Dimatix printer.
  • Controlled interlayer thermal treatments at 30 °C and 450 °C.
  • X-ray photoelectron spectroscopy (XPS) to investigate the NiO formation mechanism.
  • Performance evaluation in a p-DSSC with a novel push-pull dye (RBG-174) and iodine electrolyte.

Main Results:

  • Mesoporous NiO films with dual-pore (nanoparticulate-nanofiber) structure obtained at 30 °C.
  • Denser NiO films without dual structure obtained at 450 °C.
  • Nickel hydroxide (Ni(OH)2) identified as an intermediate in NiO formation.
  • Optimized NiO photocathodes (860 nm) with an additional NiOx layer achieved a short-circuit current density of 3.42 mA cm⁻².

Conclusions:

  • Inkjet printing is a viable method for fabricating mesoporous NiO films.
  • Thermal treatment significantly influences NiO morphology and performance in p-DSSC devices.
  • An intermediate NiOx layer enhances the performance of NiO-based photocathodes.