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A Simple and Scalable Fabrication Method for Organic Electronic Devices on Textiles
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CVD Polymers for Devices and Device Fabrication.

Minghui Wang1, Xiaoxue Wang1, Priya Moni1

  • 1Department of Chemical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA, 02139, USA.

Advanced Materials (Deerfield Beach, Fla.)
|December 30, 2016
PubMed
Summary
This summary is machine-generated.

Chemical vapor deposition (CVD) polymerization offers a solvent-free method for creating high-purity organic thin films. This technique enables the fabrication of ultrathin, defect-free polymer layers for advanced electronic devices.

Keywords:
CVDdeviceelectronicsfilmspolymer

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Area of Science:

  • Materials Science
  • Polymer Chemistry
  • Nanotechnology

Background:

  • Chemical vapor deposition (CVD) polymerization synthesizes organic thin films from vapor phase reactants.
  • CVD polymers are integrated into various devices, including dielectric, semiconducting, and conducting applications.
  • The solvent-free nature of CVD prevents dewetting and pinhole defects, enabling high-purity layer growth.

Purpose of the Study:

  • To discuss the mechanisms of major CVD polymerization techniques.
  • To highlight recent advancements in CVD polymer applications for devices.
  • To emphasize initiated CVD (iCVD) and oxidative CVD (oCVD) polymerization.

Main Methods:

  • Direct synthesis of organic thin films from vapor phase reactants.
  • Fabrication of ultrathin (<10 nm) polymeric device layers with limited contaminants and defects.
  • Conformal coating of rough surfaces and complex geometries using CVD polymers.

Main Results:

  • CVD enables the growth of high-purity, defect-free polymer layers.
  • Ultrathin CVD polymer layers (<10 nm) are successfully fabricated.
  • CVD is suitable for insoluble conductive polymers, functional groups, and crosslinked networks.

Conclusions:

  • CVD polymerization is a versatile technique for creating advanced organic thin films.
  • The method offers advantages like solvent-free processing, high purity, and conformal coating.
  • CVD, particularly iCVD and oCVD, shows significant promise for device fabrication.