Mirror-field confined compact plasma source using permanent magnet for plasma processings.

Area of Science:

• Plasma Physics
• Materials Science
• Surface Engineering

Background:

• Electron Cyclotron Resonance (ECR) plasma sources are crucial for advanced materials processing.
• Minimizing ion bombardment damage is essential for high-quality substrate treatment.
• Existing ECR sources often face challenges in controlling plasma density and ion flux.

Purpose of the Study:

• To develop a compact ECR plasma source using permanent magnets for high-quality plasma processing.
• To achieve high-density reactive species delivery to substrates while minimizing ion bombardment.
• To investigate the plasma parameters and spatial distribution within the developed source.

Main Methods:

• Development of a mirror-field confined compact ECR plasma source utilizing permanent magnets.
• Localization of the ECR position between a microwave window and a quartz limiter.
• Plasma transport through the quartz limiter to control core plasma radius (15 mm).
• Langmuir probe measurements for plasma parameter investigation.

Main Results:

• Production of high-density plasma (>10^11 cm^-3) with microwave power ≥10 W at 5.85 GHz.
• Significant reduction in ion current density (approx. two orders of magnitude) at 40 mm radial distance from the core plasma.
• Demonstration of controlled plasma confinement and transport.

Conclusions:

• The developed compact ECR plasma source effectively generates high-density plasma.
• The source design successfully minimizes ion bombardment damage on substrates, crucial for sensitive processing applications.
• This technology holds promise for advanced semiconductor fabrication and surface modification processes.