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Updated: Mar 8, 2026
Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
Development of a highly transparent, low-resistance lithium-doped nickel oxide triple-layer film deposited by
Chia-Ching Wu1, Wei-Chen Shih1
1Department of Electronic Engineering, Kao Yuan University, Kaohsiung, Taiwan, Republic of China. 9113718@gmail.com.
Abstract:
This research presents a triple-layer transparent conductive oxide thin film, with a lithium-doped nickel oxide/silver/lithium-doped nickel oxide (L-NiO/Ag/L-NiO) structure using radio-frequency (RF) magnetron sputtering on glass substrates. The high transmittance L-NiO thin films were deposited using the sputtering method with Ar/H2 as the reaction gases. The triple-layer structure, L-NiO/Ag/L-NiO, showed impressive electrical conductivity. The figure of merit (FOM) results indicated that the L-NiO/Ag/L-NiO triple-layer thin films with Ag deposition times of 2 min possessed satisfactory optical and electrical properties for potential applications.
