Effect of the KF post-deposition treatment on grain boundary properties in Cu(In, Ga)Se2 thin films

N Nicoara1, Th Lepetit2, L Arzel2

  • 1INL - International Iberian Nanotechnology Laboratory, Av. Mestre José Veiga s/n, 4715-330 Braga, Portugal.

Scientific Reports
|January 28, 2017
PubMed

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