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Updated: Mar 7, 2026

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
Published on: August 19, 2016
Formation of nanostructured metallic glass thin films upon sputtering
Sergey V Ketov1, Rastko Joksimovic1, Guoqiang Xie2
1WPI Advanced Institute for Materials Research, Tohoku University, Aoba-Ku, Sendai 980-8577, Japan.
Abstract:
Morphology evolution of the multicomponent metallic glass film obtained by radio frequency (RF) magnetron sputtering was investigated in the present work. Two modes of metallic glass sputtering were distinguished: smooth film mode and clustered film mode. The sputtering parameters, which have the most influence on the sputtering modes, were determined. As a result, amorphous Ni-Nb thin films with a smooth surface and nanoglassy structure were deposited on silica float glass and Si substrates. The phase composition of the target appeared to have a significant influence on the chemical composition of the deposited amorphous thin film. The differences in charge transport and nanomechanical properties between the smooth and nanoglassy Ni-Nb film were also determined.
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