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Updated: Mar 7, 2026

The Effect of Interfacial Chemical Bonding in TiO2-SiO2 Composites on Their Photocatalytic NOx Abatement Performance
Published on: July 4, 2017
Evolution of CH3NO2/Si interfacial chemistry under reaction conditions: a combined experimental and theoretical study
Xueqiang Zhang1, Chen-Guang Wang2, Wei Ji2
1Radiation Laboratory, Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, IN 46556, USA.
Abstract:
Dissociative adsorption of CH3NO2 onto a Si(100)-2 × 1 surface is studied using ambient-pressure X-ray photoelectron spectroscopy (AP-XPS) and density functional theory (DFT) calculations. The unprecedented scission of the C-N bond in CH3NO2 and the formation of a Si-CH3 surface species are observed at elevated CH3NO2 pressure (0.5 mbar) and temperature (>573 K).
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