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Published on: July 9, 2015
Process-Accessible States of Block Copolymers
1Institut für Theoretische Physik, Georg-August-Universität Göttingen, Friedrich-Hund-Platz 1, D 37077 Göttingen, Germany.
This study explores process-directed self-assembly in block copolymers, transforming unstable states into stable structures. Researchers found that the final mesostructure symmetry often matches the initial state, enabling fabrication of novel materials.
Area of Science:
- Polymer Science
- Materials Chemistry
- Soft Matter Physics
Background:
- Block copolymers self-assemble into ordered mesostructures.
- Process-directed self-assembly utilizes thermodynamic control over kinetic pathways.
- Controlling kinetics allows access to metastable states beyond equilibrium.
Purpose of the Study:
- Investigate the kinetics of self-assembly in ACB triblock copolymers after transforming the middle C block to A.
- Determine which metastable mesostructures can be fabricated by varying block copolymer composition.
- Explore the relationship between initial and final mesostructure symmetries.
Main Methods:
- Utilized a prototypical process (e.g., photochemical transformation) to convert ABB triblock copolymers to AAB.
- Systematically varied block copolymer composition to map process-accessible states.
- Analyzed the resulting mesostructures, including equilibrium and metastable phases.
Main Results:
- Identified a diagram of process-accessible states for AAB copolymers, including 7 metastable periodic mesostructures.
- Discovered Schoen's F-RD periodic minimal surface as an accessible metastable structure.
- Observed that the final metastable mesostructure generally retains the symmetry of the initial ABB copolymer equilibrium mesophase.
Conclusions:
- Process-directed self-assembly offers a route to fabricate specific metastable mesostructures in block copolymers.
- The symmetry of the initial equilibrium phase serves as a predictor for the final metastable phase symmetry.
- This approach expands the range of accessible nanostructures for advanced material applications.
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