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Intersubband transition in lattice-matched BGaN/AlN quantum well structures with high absorption coefficients
Optics Express
|March 1, 2017
Summary
Lattice-matched Boron Gallium Nitride/Aluminum Nitride (BGaN/AlN) quantum wells show enhanced intersubband absorption. This improvement makes them suitable for telecommunication applications, offering an alternative to strained Gallium Nitride/Aluminum Nitride (GaN/AlN) quantum wells.
Area of Science:
- Semiconductor physics
- Materials science
- Optoelectronics
Background:
- Quantum well (QW) structures are crucial for optoelectronic devices.
- Gallium Nitride/Aluminum Nitride (GaN/AlN) QWs are widely studied but can suffer from strain.
- Boron Gallium Nitride/Aluminum Nitride (BGaN/AlN) offers potential for improved properties.
Purpose of the Study:
- To theoretically investigate the intersubband absorption properties of lattice-matched BGaN/AlN QW structures.
- To compare the absorption characteristics of BGaN/AlN QWs with conventional GaN/AlN QWs.
- To explore the potential of BGaN/AlN QWs for telecommunication applications.
Main Methods:
- Effective mass theory was employed to model the quantum well structures.
- Conduction band nonparabolicity was considered in the theoretical calculations.
- Lattice-matched BGaN/AlN and GaN/AlN QW structures grown on AlN substrates were analyzed.
Main Results:
- BGaN/AlN QW structures exhibit significantly enhanced intersubband absorption coefficients compared to GaN/AlN QWs.
- The enhanced absorption is attributed to a larger intersubband dipole moment and quasi-Fermi-level separation.
- Increased carrier confinement due to a larger internal field in BGaN/AlN QWs contributes to the improved absorption.
Conclusions:
- BGaN/AlN QW structures demonstrate superior intersubband absorption properties under lattice-matched conditions.
- These structures present a promising alternative to strained GaN/AlN QWs for optoelectronic applications.
- The enhanced absorption characteristics make BGaN/AlN QWs suitable for telecommunication applications at 1.55 µm.
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