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Updated: Mar 6, 2026

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Tokiyoshi Matsuda1, Kenta Umeda2, Yuta Kato2
1Innovative Materials and Processing Research Center, Ryukoku University, Japan HRC205, 1-5, Seta Oe-cho, Otsu, Shiga, 520-2194, Japan.
High-performance Gallium-Tin-Oxide (GTO) thin-film transistors (TFTs) were developed without rare metals. These GTO TFTs exhibit superior stability compared to Indium-Gallium-Zinc-Oxide (IGZO) TFTs.
11:09Scalable Solution-processed Fabrication Strategy for High-performance, Flexible, Transparent Electrodes with Embedded Metal Mesh
Published on: June 23, 2017
14:16Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
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