Control of Multilevel Resistance in Vanadium Dioxide by Electric Field Using Hybrid Dielectrics

We investigate the effect of electric field on VO₂ back-gated field effect transistor (FET) devices. Using hybrid dielectric layers, we demonstrate the highest resistance modulation on the order of 10² in VO₂ at a positive gate bias of 80 V (1.6 MV/cm). VO₂ FET devices are prepared on SiO₂ substrates of different thicknesses (100-300 nm) and hybrid dielectric layers of Al₂O₃/SiO₂ (500 nm). For thicknesses less than 300 nm, no electric-field effects are observed, whereas for a 300 nm thickness, a small decrease in resistance is observed under a 0.2 MV/cm electric field. Under the electrostatic effect, the carrier concentration increases in VO₂ devices, decreasing the resistance and the transition temperature from 66.75 to 64 °C. The leakage analysis shows that the interface quality of VO₂ films on hybrid dielectric layers can be further improved. These studies suggest a multilevel fast resistance switching with the electric field and give an insight into the gate-source leakage current, which limits the phase transition in VO₂ in an electric field.