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Visible-light Induced Reduction of Graphene Oxide Using Plasmonic Nanoparticle
Published on: September 22, 2015
Making Graphene Nanoribbons Photoluminescent
B V Senkovskiy1, M Pfeiffer2, S K Alavi2,3
1II. Physikalisches Institut, Universität zu Köln , Zülpicher Strasse 77, 50937 Köln, Germany.
Nano Letters
|March 31, 2017
Summary
We transferred graphene nanoribbons (GNRs) to insulating substrates, enhancing their luminescence through defect creation. This enables maskless lithography by laser writing luminescent patterns in GNR films.
Area of Science:
- Materials Science
- Nanotechnology
- Condensed Matter Physics
Background:
- Graphene nanoribbons (GNRs) are promising materials for nanoelectronic and photonic devices.
- Understanding the photophysics of GNRs on insulating substrates is crucial for device applications.
- Controlled modification of GNR properties is essential for advanced functionalities.
Purpose of the Study:
- To demonstrate alignment-preserving transfer of GNRs onto insulating substrates.
- To characterize the photophysics and optical properties of transferred GNRs.
- To explore methods for enhancing GNR luminescence and enabling pattern writing.
Main Methods:
- Polarized Raman and photoluminescence (PL) spectroscopies were used for characterization.
- GNRs were transferred to insulating substrates while preserving their alignment.
- Luminescence enhancement was achieved via blue laser irradiation and hydrogenation.
- Laser writing was employed to create luminescent patterns by defect generation.
Main Results:
- Raman scattered light and PL were polarized along the GNR axis.
- Excitonic peaks in Raman cross-section indicated transitions in 1D parabolic subbands.
- Intrinsic PL of GNRs was low but significantly enhanced by defect formation (sp3 defects).
- Maskless lithography was achieved by laser writing luminescent patterns in GNR films.
Conclusions:
- Alignment-preserving transfer of GNRs to insulating substrates is feasible.
- Defect engineering, particularly sp3 defect formation, is an effective strategy to enhance GNR luminescence.
- Laser-induced defect generation allows for maskless lithography and patterned luminescence in GNR films.
- These findings pave the way for GNRs in optical devices and advanced lithography techniques.

