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Related Experiment Videos

Optical pump-rejection filter based on silicon sub-wavelength engineered photonic structures.

Diego Pérez-Galacho, Carlos Alonso-Ramos, Florent Mazeas

    Optics Letters
    |April 15, 2017
    PubMed
    Summary
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    Researchers developed novel silicon-on-insulator (SOI) Bragg filters using sub-wavelength index engineering. This breakthrough enables narrow-band photonic filters with relaxed fabrication constraints, simplifying device manufacturing.

    Area of Science:

    • Photonics
    • Materials Science
    • Nanotechnology

    Background:

    • Silicon-on-insulator (SOI) platforms enable compact photonic circuits due to high index contrast.
    • High contrast in SOI hinders narrow-band Bragg filter fabrication, requiring nanometer-scale corrugations or complex double-etch processes.
    • Existing methods for narrow-band Bragg filters in SOI are challenging to fabricate.

    Purpose of the Study:

    • To demonstrate a novel SOI Bragg filter design overcoming fabrication limitations.
    • To achieve narrow-band rejection using sub-wavelength index engineering and a differential corrugation width.
    • To simplify Bragg filter fabrication through a single etch step.

    Main Methods:

    • Utilizing sub-wavelength index engineering in a differential corrugation width configuration.

    Related Experiment Videos

  • Implementing a double periodicity structure for Bragg filter design.
  • Fabricating a 220 nm thick silicon Bragg filter with a single etch step.

    • Main Results:

    • Experimental demonstration of a single-etch SOI Bragg filter.
    • Achieved a narrow rejection bandwidth of 1.1 nm.
    • Obtained an extinction ratio exceeding 40 dB with a 150 nm corrugation width.
    • Demonstrated a 10-fold increase in corrugation width compared to conventional methods.

    Conclusions:

    • The proposed sub-wavelength index engineering approach enables efficient narrow-band SOI Bragg filters.
    • The differential corrugation width and double periodicity structure simplify fabrication with a single etch step.
    • This method relaxes fabrication constraints, paving the way for easier manufacturing of advanced photonic devices.