Oxidation suppression during hydrothermal phase reversion allows synthesis of monolayer semiconducting MoS2 in stable
Zhongying Wang1, Yin-Jia Zhang, Muchun Liu
1School of Engineering Brown University, Providence, RI 02912, USA. robert_hurt@brown.edu.
Abstract:
This letter demonstrates a simple method to achieve high-yields of 1H semiconducting MoS2 monolayers in concentrated, colloidally-stable aqueous suspension. The method is based on oxidation suppression during the hydrothermal processing step used for metal-to-semiconductor phase reversion. Accompanying DFT calculations on elementary steps in the MoS2 wet oxidation reaction suggest that a two-site corrosion mechanism is responsible for the observed high reactivity and low stability of 1T metallic MoS2.
More Related Videos
08:57Scalable Syntheses of Graphene Oxide and Reduced Graphene Oxide using Cascade Design Oxidation and Highly Basic Reduction Reactions
Published on: July 3, 2025
07:47Reverse Microemulsion-mediated Synthesis of Monometallic and Bimetallic Early Transition Metal Carbide and Nitride Nanoparticles
Published on: November 27, 2015
Related Concept Videos
Oxidation of Alkenes: Syn Dihydroxylation with Potassium Permanganate
Oxidation of Alkenes: Syn Dihydroxylation with Osmium Tetraoxide
Hydroboration-Oxidation of Alkenes
Radical Oxidation of Allylic and Benzylic Alcohols
Oxidation of Alcohols
The process of oxidation in a chemical reaction is observed in any of the three forms:
Preparation and Reactions of Thiols
