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Updated: Mar 3, 2026

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
Thickness-dependent Schottky barrier height of MoS2 field-effect transistors
Junyoung Kwon1, Jong-Young Lee, Young-Jun Yu
1Department of Materials Science and Engineering, Yonsei University, Seoul, 03722, Korea. gwanlee@yonsei.ac.kr.
Abstract:
2D semiconductors, including transition metal dichalcogenides (TMDs), have been widely studied recently. However, the device performance is deteriorated due to the significant contact resistance. The contact resistance of MoS2-metal contacts decreases with the thickness of MoS2. We obtained a Schottky barrier height as low as about 70 meV when MoS2 is trilayer-thick. It is important to find the optimal choice of contact metal and layer thickness of MoS2.
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