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Use of Supramolecular Assemblies as Lithographic Resists
Scott M Lewis1, Antonio Fernandez1, Guy A DeRose2
1The School of Chemistry, The University of Manchester, Oxford Road, Manchester, M13 9PL, UK.
Angewandte Chemie (International Ed. in English)
|May 16, 2017
Abstract:
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high-resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.
