Synthesis and fast transfer of monolayer MoS₂ on reusable fused silica

Atomically thin, two-dimensional materials ranging from superconductors, metals, semiconductors to insulators are emerging as potential candidates for the next-generation digital electronics and optoelectronic applications. Their synthesis on a commonly used substrate and fast transfer to a plenty of desired substrates need to be addressed to meet the industrialization criteria for practical applications. In this study, fused silica, which is amorphous, transparent, and inexpensive, was examined as a substrate for MoS₂ synthesis. The MoS₂ growth behavior on fused silica and its crystal quality were evaluated. In addition, a novel way was developed to quickly peel off MoS₂ from the fused silica surface within 15 s (i.e., etching in an acidic solution to detach the edge and completing the delamination via a capillary force at the interface between air and water). The fused silica could be reused at least three times. Moreover, the produced MoS₂ domains showed no obvious degradation of quality. These results support the feasibility of MoS₂ synthesis on amorphous and recyclable substrates and also the time-saving transfer for the cost-effective and high-quality production of other two-dimensional materials.