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Updated: Mar 2, 2026

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Patterning via Optical Saturable Transitions - Fabrication and Characterization

Published on: December 11, 2014

Optically Patternable Metamaterial Below Diffraction Limit.

Youngseop Lee, Sang-Gil Park, SeokJae Yoo¹

¹Department of Physics, Korea University , 145 Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea.

ACS Applied Materials & Interfaces

|May 25, 2017

Summary

This summary is machine-generated.

We developed an optically patternable metamaterial for ultraviolet nanolithography. This novel photoresist enables sub-diffraction limit feature sizes using surface plasmon excitation.

Keywords:

meta-photoresist subdiffraction limit superlens effect surface plasmon excitation ultraviolet nanolithography

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Area of Science:

Materials Science
Nanotechnology
Optics

Background:

Conventional photolithography is limited by the diffraction of light.
Achieving feature sizes below the diffraction limit requires advanced techniques.

Purpose of the Study:

To report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit.
To demonstrate a new class of photoresist for sub-diffraction limit nanolithography.

Main Methods:

Fabrication of OPM using spin-coating, oblique angle deposition, and solid-state embedment.
Embedding monolayered silver nanoislands within a photosensitive polymer.
Utilizing surface plasmon excitation for photolithographic definition.

Main Results:

The OPM exhibits negative effective permittivity and high image contrast in the ultraviolet range.
Achieved a minimum feature size of 70 nm (approximately λ/5) beyond the near-field zone.
Demonstrated clear photolithographic definition enabled by surface plasmon excitation.

Conclusions:

The developed OPM is a novel photoresist for ultraviolet nanolithography.
This metamaterial overcomes the diffraction limit for nanoscale patterning.
Enables precise fabrication of sub-wavelength features.