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Characterization of Self-Assembled Monolayers on a Ruthenium Surface.

A Shaheen1, J M Sturm1, R Ricciardi1

  • 1Industrial focus group XUV Optics, MESA+ Institute for Nanotechnology, and ‡MNF group, MESA+ Institute for Nanotechnology, University of Twente , Enschede, The Netherlands.

Langmuir : the ACS Journal of Surfaces and Colloids
|June 7, 2017
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Summary

Ruthenium surfaces were stabilized using self-assembled monolayers (SAMs) of 1-hexadecanethiol. H-radical cleaning yielded stable, densely packed SAMs, unlike other cleaning methods, offering enhanced surface modification for ruthenium.

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Area of Science:

  • Surface science
  • Materials chemistry
  • Nanotechnology

Background:

  • Ruthenium surfaces are crucial in catalysis and electronics.
  • Achieving stable surface modification is key for device performance.
  • Self-assembled monolayers (SAMs) offer a route to control surface properties.

Purpose of the Study:

  • To investigate the formation and stability of 1-hexadecanethiol SAMs on ruthenium.
  • To compare the effects of different substrate cleaning methods on SAM quality.
  • To understand the bonding and environmental stability of these modified ruthenium surfaces.

Main Methods:

  • Deposition of 1-hexadecanethiol SAMs on polycrystalline ruthenium thin films.
  • Substrate preparation using piranha cleaning, piranha + H2SO4 cleaning, and H-radical cleaning.
  • Analysis of SAM growth, dynamics, and stability.
  • X-ray photoelectron spectroscopy (XPS) to confirm metal-sulfur bonding.

Main Results:

  • H-radical cleaned ruthenium surfaces formed densely packed 1-hexadecanethiol SAMs.
  • These SAMs exhibited stability in a nitrogen atmosphere.
  • XPS confirmed metal-sulfur (Ru-S) bonding with a sulfur peak at 162.3 eV.
  • SAMs on other substrates decayed within hours under ambient conditions.

Conclusions:

  • H-radical cleaning is superior for creating stable, well-ordered SAMs on ruthenium.
  • The stability of SAMs is highly dependent on the substrate preparation and environmental exposure.
  • This study provides insights into robust surface functionalization of ruthenium for potential applications.