Two-layer and composite films based on oxidized and fluorinated graphene

Area of Science:

• Materials Science
• Nanotechnology
• Electrical Engineering

Background:

• Graphene oxide (GO) films show promise for electronic applications but require property enhancement.
• Fluorinated graphene (FG) offers potential improvements to GO-based materials.

Purpose of the Study:

• To investigate the production and properties of dielectric films based on oxidized and fluorinated graphene suspensions.
• To evaluate the insulating characteristics, thermal stability, and charge properties of these novel films.

Main Methods:

• Fabrication of two-layer films (FG on GO) and composite films (mixed GO and FG suspensions).
• Characterization of film properties including optical transmission, leakage current, thermal stability, and charge density.
• Analysis of the impact of FG on GO structural defects and conductivity.

Main Results:

• FG addition significantly improves GO film properties.
• Two-layer and composite FG/GO films exhibit excellent insulating properties with leakage currents 3-5 orders of magnitude lower than GO or FG alone.
• These films demonstrate enhanced thermal stability and low interfacial charge density (<1.4 × 10¹¹ cm^-2).
• Thin FG layers effectively passivate defects in GO films, blocking conductivity.

Conclusions:

• Composite and two-layer films of fluorinated graphene and graphene oxide are promising dielectric materials.
• These films possess superior insulating properties, thermal stability, and low charge density compared to individual components.
• Potential applications include gate dielectrics and interlayer insulators in 2D printed and flexible electronics.