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Interfacial reactions at Fe/topological insulator spin contacts
Sarmita Majumder1, Karalee Jarvis1, Sanjay K Banerjee1
1Microelectronics Research Center, University of Texas, Austin, Texas 78758.
Iron (Fe) deposition on topological insulators (TIs) like Bi2Se3 forms an abrupt FeSe binary phase. Adding silicon oxide (SiOx) prevents alloy formation on Bi2Te3, crucial for spintronics applications.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Topological insulators (TIs) are promising materials for spintronics.
- Understanding interfacial properties is crucial for device fabrication.
- Ferromagnetic metal deposition on TIs can lead to interfacial reactions.
Purpose of the Study:
- Investigate the composition and abruptness of interfacial layers formed by Fe deposition on TIs.
- Characterize the interfacial phases and their structural properties.
- Explore methods to control interfacial reactions for spintronic applications.
Main Methods:
- Cross-sectional transmission electron microscopy (TEM).
- Interfacial elemental mapping using TEM.
- Deposition of Fe on Bi2Se3, Bi2Te3, and SiO2/Bi2Te3.
Main Results:
- Fe reacts with Bi2Se3 near room temperature, forming a 5 nm thick, single-crystalline FeSe0.92 phase.
- The FeSe0.92 phase is predominantly (001) oriented with a lattice fringe spacing of 0.55 nm.
- Fe/Bi2Te3 forms a polycrystalline interfacial alloy, which is suppressed by an intervening SiO2 layer.
Conclusions:
- Fe deposition on Bi2Se3 results in a well-defined, abrupt interfacial binary phase.
- An SiO2 interlayer effectively prevents interfacial alloy formation between Fe and Bi2Te3.
- These findings offer control over interfacial properties for spintronic device development.
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