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Nanoscale 2.5-dimensional surface patterning with plasmonic lithography.

Howon Jung¹, Changhoon Park¹, Seonghyeon Oh¹

¹Nano Photonics Laboratory, School of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 120-749, Republic of Korea.

Scientific Reports

|August 31, 2017

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Plasmonic lithography now enables nanoscale 2.5D surface patterning. This advanced technique precisely fabricates multiscale structures with high accuracy, paving the way for novel applications.

Area of Science:

Nanotechnology
Surface Science
Optics

Background:

Plasmonic lithography offers high-resolution surface patterning capabilities.
Existing methods face limitations in achieving 2.5D nanoscale surface features.
Precise control over surface topography at the nanoscale is crucial for advanced devices.

Purpose of the Study:

To extend plasmonic lithography for nanoscale 2.5-dimensional (2.5D) surface patterning.
To develop a theoretical model for predicting the system's impulse response.
To demonstrate practical fabrication of diverse nanoscale and microscale structures.

Main Methods:

Developed a theoretical model using quasi-spherical waves and surface plasmon-polaritons to describe field distribution.
Employed deconvolution techniques to construct exposure maps for target shapes.

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Fabricated various structures including cones, microlens arrays, nanoneedles, and multiscale patterns.

Main Results:

Successfully extended plasmonic lithography to 2.5D nanoscale surface patterning.
Demonstrated fabrication of multiscale structures ranging from tens of nanometers to micrometers.
Achieved a root-mean-square error of 4.7 nm and a surface roughness of 11.5 nm.

Conclusions:

Plasmonic lithography is a viable technique for high-precision 2.5D nanoscale surface structuring.
The developed theoretical model accurately predicts system performance.
The method allows for versatile fabrication of complex multiscale nanostructures.