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Process-specific mechanisms of vertically oriented graphene growth in plasmas
Subrata Ghosh1, Shyamal R Polaki1, Niranjan Kumar1
1Surface and Nanoscience Division, Materials Science Group, Indira Gandhi Centre for Atomic Research - Homi Bhabha National Institute, Kalpakkam - 603102, India.
Beilstein Journal of Nanotechnology
|September 7, 2017
Summary
Plasma-produced vertically oriented graphene nanosheets (VGNs) have tunable structures. Process parameters like temperature and power optimize VGN growth for applications in sensing and energy storage.
Area of Science:
- Materials Science
- Plasma Physics
- Nanotechnology
Background:
- Vertically oriented graphene nanosheets (VGNs) possess unique structures crucial for various applications.
- Controlling VGN morphology and structure is key to optimizing their performance.
Purpose of the Study:
- To investigate the impact of key process parameters on the catalyst-free growth of VGNs.
- To understand the growth mechanism and establish correlations between process conditions and VGN properties.
Main Methods:
- Utilized microwave plasmas for catalyst-free VGN synthesis.
- Varied deposition temperature, discharge power, and plasma-substrate distance.
- Analyzed growth rates, activation energy, morphology, crystallinity, and wettability.
Main Results:
- Identified nanoscale graphitic islands as initiation sites for vertical growth with low activation energy (0.57 eV).
- Optimized growth rate and quality by increasing substrate temperature, decreasing plasma-substrate distance, and increasing discharge power.
- Demonstrated control over morphology, crystallinity, wettability, and sheet resistance while maintaining sp3 content.
Conclusions:
- Established correlations between wetting characteristics, morphology, and structural quality.
- Showcased the influence of substrate temperature and electric field on VGN alignment.
- Provided insights for optimizing VGN production for targeted applications like sensing, field emission, catalysis, and energy storage.
