Detailed kinetics study of arsenate adsorption by a sequentially precipitated binary oxide of iron and silicon

This paper comprises a comprehensive kinetic study for the adsorptive removal of As (V) from aqueous medium by mixed oxide (MO) of iron and silicon. The multi-linearity of the intraparticle diffusion model pointed towards the likelihood of both the pore and film diffusion. The Boyd model validated film diffusion to be the principal mechanism responsible for controlling the rate of the arsenate adsorption on MO. The negative entropy of activation (ΔS^#) suggested the adsorption mechanism to be associative in nature. The non-negative values of ΔG^# suggested the presence of an energy barrier to be surmounted for the reaction to occur.