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Integrated optical phased arrays for quasi-Bessel-beam generation
Optics Letters
|September 29, 2017
Summary
Researchers developed integrated optical phased arrays to generate quasi-Bessel beams on a CMOS-compatible chip. This innovation enables precise control over light beams for applications like multiparticle trapping and laser lithography.
Area of Science:
- Photonics
- Optical Engineering
- Integrated Optics
Background:
- Bessel beams feature elongated central beams, making them valuable for applications such as multiparticle trapping and laser lithography.
- Generating Bessel beams typically requires complex optical setups, limiting their widespread adoption.
Purpose of the Study:
- To propose and experimentally demonstrate integrated optical phased arrays for generating quasi-Bessel beams.
- To adapt continuous Bessel theory for on-chip generation of Bessel-Gauss beams using optical phased arrays.
- To investigate the impact of phased array parameters on beam quality.
Main Methods:
- Utilized continuous Bessel theory to derive phase and amplitude conditions for on-chip Bessel-Gauss beam generation.
- Modified a 1D splitter-tree-based phased array architecture for arbitrary passive control of element phase and amplitude.
- Experimentally validated the proposed method using the modified phased array architecture.
Main Results:
- Successfully demonstrated on-chip generation of quasi-Bessel beams.
- Achieved a Bessel length of approximately 14 mm.
- Obtained a power full width at half maximum of approximately 30 μm.
Conclusions:
- Integrated optical phased arrays offer a viable platform for generating quasi-Bessel beams in a CMOS-compatible manner.
- The developed architecture provides precise control over beam characteristics, paving the way for advanced optical applications.
- This work advances on-chip beam shaping capabilities for micro- and nano-scale manipulation.

