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Characteristics and Nomenclature of Copolymers

Characteristics and Nomenclature of Copolymers

Copolymers are the products obtained from the polymerization of multiple monomer species. So, in a polymer chain itself, there can be multiple repeating units that come from different monomers. The process of synthesizing a polymer from different monomer species is called copolymerization. When two monomers are involved, the polymer is known as a bipolymer. Polymers with three and four monomers are termed terpolymers and quaterpolymers, respectively. Figure 1 depicts the copolymerization of...

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Synthesis of Monodisperse Cylindrical Nanoparticles via Crystallization-driven Self-assembly of Biodegradable Block Copolymers

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Carbohydrate-based block copolymer systems: directed self-assembly for nanolithography applications.

I Otsuka¹, N Nilsson, D B Suyatin

¹Univ. Grenoble Alpes, CNRS, CERMAV, 38000 Grenoble, France. borsali@cermav.cnrs.fr.

|September 30, 2017

Summary

Directed self-assembly of maltoheptaose-block-polystyrene block copolymers (BCPs) enables sub-10 nm nanolithography. This study demonstrates successful graphoepitaxy and pattern transfer for advanced nanoscale fabrication.

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Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

Fabricating Reactive Surfaces with Brush-like and Crosslinked Films of Azlactone-Functionalized Block Co-Polymers

Published on: June 30, 2018

Area of Science:

Nanoscience and Nanotechnology
Materials Science
Polymer Chemistry

Background:

Block copolymers (BCPs) offer a promising route for nanolithography, particularly for creating structures below 10 nm.
Directed self-assembly (DSA) and pattern transfer are critical challenges for BCPs at these small scales.

Purpose of the Study:

To demonstrate directed self-assembly (DSA) of a maltoheptaose-block-polystyrene (MH-b-PS) BCP system using graphoepitaxy for sub-10 nm nanolithography.
To investigate the self-organization behavior and pattern transfer capabilities of the MH-b-PS BCP.

Main Methods:

Utilized graphoepitaxy with guiding patterns created by electron beam lithography (EBL) and lift-off.
Employed solvent vapor annealing in tetrahydrofuran (THF) and water for BCP self-organization.
Analyzed BCP patterns using Atomic Force Microscopy (AFM) and evaluated etch selectivity using Reactive Ion Etching (RIE).

Main Results:

Achieved sub-10 nm scale cylinder formation of the maltoheptaose (MH) block within a polystyrene (PS) matrix.
Demonstrated good ordering of vertical and horizontal cylindrical MH arrays via DSA for guiding patterns with 150-200 nm separation.
Observed a significantly higher etch rate for MH (up to 14x) compared to PS using O2 and CF4 plasma in RIE.

Conclusions:

The maltoheptaose-block-polystyrene (MH-b-PS) BCP system shows significant potential for nanolithographic applications below 10 nm.
Successful DSA and differential etch rates are key for fabricating high-resolution nanostructures.