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Updated: Feb 22, 2026

In Situ SIMS and IR Spectroscopy of Well-defined Surfaces Prepared by Soft Landing of Mass-selected Ions
Published on: June 16, 2014
Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition
S Flege1, R Hatada1, A Derepa1
1Department of Materials Science, Technische Universität Darmstadt, 64287 Darmstadt, Germany.
Abstract:
A sample holder with a large open area offers several benefits when used in the process of plasma immersion ion implantation and deposition in which the plasma is generated by a high voltage applied to the sample holder: The ignition voltage of the plasma is lower, and the deposition rate can be several times higher than in the case of a normal plate-like holder. There is a more pronounced edge effect regarding the film thickness. Other film properties are also affected; for diamond-like carbon films, the film structure exhibits more disorder. The hardness of the samples is similar, with the surfaces of the samples being very smooth.
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