Optimization of instrument matrix for Mueller matrix ellipsometry based on partial elements analysis of the Mueller...

Area of Science:

• Optical Physics
• Metrology
• Materials Science

Background:

• Mueller matrix ellipsometry (MME) is crucial for characterizing optical properties of materials.
• Measurement precision in MME can be limited by noise, including Gaussian additive and Poisson shot noise.
• Accurate determination of ellipsometric parameters is essential for sample analysis.

Purpose of the Study:

• To optimize instrument matrices for polarization state generator (PSG) and analyzer (PSA) in MME.
• To minimize measurement variance of specific Mueller matrix elements under different noise conditions.
• To enhance the statistical precision of ellipsometric parameter estimation.

Main Methods:

• Mathematical optimization of PSG and PSA instrument matrices.
• Analysis of measurement variance under Gaussian additive noise.
• Analysis of measurement variance under Poisson shot noise.
• Comparison of optimized matrices with previous configurations.

Main Results:

• Optimized instrument matrices significantly decrease measurement variance compared to previous designs.
• The proposed matrices statistically improve the measurement precision of ellipsometric parameters.
• Optimal matrices for Poisson shot noise are identical to those for Gaussian additive noise.
• Optimal matrices are independent of the specific ellipsometric parameters being measured.

Conclusions:

• The developed optimal instrument matrices offer broad applicability in MME.
• These matrices provide a statistically improved method for precise optical characterization.
• The findings simplify MME system design by unifying optimal matrices for common noise types.