Eight-wave mixing parametrical amplification

We investigate parametrically amplified eight-wave mixing (PA-EWM). The double dressed PA-four-wave mixing (PA-FWM) is the superposition of one PA-FWM process, two different PA-six-wave mixing (PA-SWM) processes (PA-SWM1 and PA-SWM2 with external dressing field 776nm and 795nm, respectively) and one PA-EWM process. When the phases among FWM, SWM1, SWM2 and EWM change from 0 to π, the double dressed PA-FWM could gradually satisfy the pure enhancement (all 0), partial enhancement and suppression (mixture of 0 and π), or pure suppression condition (all π). The outcomes of the investigation can potentially contribute to the development of multi-channel quantum information processing and high dimensional stereoscopic imaging.