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Optimal polarization modulation for orthogonal two-axis Lloyd's mirror interference lithography.

Xiuguo Chen, Zongwei Ren, Yuki Shimizu

|October 19, 2017

Summary

Precise polarization control is key for high-contrast interference fringes in two-axis Lloyd

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Area of Science:

Optics and Photonics
Interference Lithography
Polarization Optics

Background:

Polarization control is critical for achieving desired interference fringes in two-axis Lloyd's mirror interference lithography.
Orthogonal two-axis Lloyd's mirror interferometers require specific polarization states for optimal performance.

Purpose of the Study:

To develop a model for tracing polarization states in a two-axis Lloyd's mirror interferometer.
To determine the optimal initial polarization directions for maximizing interference fringe contrast.

Main Methods:

Established a three-dimensional polarization ray-tracing model.
Derived optimal polarization combinations based on polarization orthogonality and fringe contrast.
Compared simulation results with experimental interference fringes.

Main Results:

The three-dimensional polarization ray-tracing model accurately predicts polarization evolution.
Optimal initial polarization directions were identified for enhanced fringe contrast.
Experimental verification confirmed the model's feasibility and the effectiveness of the optimal polarization modulation.

Conclusions:

The developed model provides a robust method for polarization control in two-axis Lloyd's mirror interferometry.
Optimal polarization strategies are crucial for achieving high-quality interference fringes.
This work advances the precision of interference lithography techniques.