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Beam drift error and control technology for scanning beam interference lithography.

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    This study models scanning beam interference lithography, revealing how beam drift errors impact grating mask quality. A new stable beam system significantly improves fabrication precision for diffraction gratings.

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    Area of Science:

    • Optical lithography
    • Nanofabrication
    • Diffraction grating production

    Background:

    • Scanning beam interference lithography (SBIL) is crucial for high-quality grating mask fabrication.
    • Beam drift errors in SBIL systems can degrade interference patterns and fabrication accuracy.
    • Understanding these errors is essential for precise large-scale diffraction grating manufacturing.

    Purpose of the Study:

    • To establish a mathematical model for step-scanning exposure in SBIL.
    • To analyze the impact of beam drift errors (δx and δy) on interference images and grating quality.
    • To design and validate a system for stabilizing the exposed beam to mitigate drift effects.

    Main Methods:

    • Development of a mathematical model for step-scanning exposure.
    • Decomposition of beam angle drift into in-plane (δx) and out-of-plane (δy) components.
    • Design and implementation of an exposed beam stable system within the SBIL setup.

    Main Results:

    • Analysis confirmed δx significantly affects interference fringes and phase lock precision.
    • δy was found to cause deflected interference strips and alter exposure dose.
    • Low-frequency beam drift was shown to decrease exposure contrast, hindering large grating fabrication.
    • The developed stable beam system achieved beam angle control accuracy better than 2.7 μrad (1σ) and position control accuracy better than 3.9 μm (1σ).

    Conclusions:

    • Beam drift errors are critical factors limiting the precision of grating masks produced by SBIL.
    • The designed exposed beam stable system effectively suppresses low-frequency beam drift.
    • The achieved control accuracies demonstrate the system's capability to meet the design goals for improved grating fabrication.