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Updated: Feb 20, 2026
Micro-masonry for 3D Additive Micromanufacturing
Published on: August 1, 2014
Reusable High Aspect Ratio 3-D Nickel Shadow Mask
M M H Shandhi1, M Leber1, A Hogan2
1Department of Electrical and Computer Engineering, University of Utah, Salt Lake City, UT, USA.
This study introduces a novel, reusable 3D Nickel (Ni) shadow mask for high aspect ratio patterning. This robust Ni shadow mask simplifies the fabrication of complex microstructures like neural electrodes.
Area of Science:
- Microfabrication
- Materials Science
- Biomedical Engineering
Background:
- Shadow mask technology enables resistless patterning on diverse substrates.
- Existing methods face limitations with complex 3D geometries and fragile materials.
Purpose of the Study:
- To develop a novel, high aspect ratio, three-dimensional (3D) Nickel (Ni) shadow mask.
- To demonstrate its application in patterning complex 3D structures with enhanced site density.
Main Methods:
- Fabrication of a 3D Ni shadow mask using laser patterning and electroplating.
- Achieving a high aspect ratio of 15:1 with specific dimensions (1.2 mm length, 40 μm width).
Main Results:
- A mechanically robust and reusable Ni shadow mask (1.5 mm tall, 100 μm base width) was successfully fabricated.
- Demonstrated application in patterning sidewalls of complex geometries, increasing Utah array active sites from 100 to 300.
Conclusions:
- The novel Ni 3D shadow mask offers a cost-effective, simpler, and faster method for patterning out-of-plane structures.
- Enables enhanced functionality for devices like neural electrodes and microneedles.
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