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Radio Frequency Magnetron Sputtering of GdBa2Cu3O7âˆ'ÃŽ ´/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 STO Single-crystal Substrates
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Structural control in porous/compact multilayer systems grown by magnetron sputtering.

A Garcia-Valenzuela1, C Lopez-Santos1, R Alvarez1,2

  • 1Instituto de Ciencia de Materiales de Sevilla (CSIC-US), Americo Vespucio, 49. E-41092 Seville, Spain.

Nanotechnology
|October 25, 2017
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Summary

Growing multilayer films using alternating magnetron sputtering techniques can cause fissures. Adding thin interlayers with energetic plasma ions effectively smooths interfaces and prevents these structural defects in porous/compact systems.

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Area of Science:

  • Materials Science
  • Thin Film Deposition
  • Surface Engineering

Background:

  • Magnetron sputtering is a common technique for depositing thin films.
  • Growing multilayer systems with alternating geometries can lead to structural defects.
  • Porous and compact layers in multilayer systems present unique challenges during deposition.

Purpose of the Study:

  • To analyze the phenomenon of fissure formation in magnetron sputtered porous/compact multilayer systems.
  • To understand the root causes of fissure emergence during the growth of these multilayer structures.
  • To develop a method for minimizing or inhibiting fissure formation in such systems.

Main Methods:

  • Alternating oblique angle and classical configuration geometries during magnetron sputtering.
  • Investigating fissure formation mechanisms related to layer roughness and interfacial coarsening.
  • Implementing thin interlayers deposited under energetic plasma ion impingement.

Main Results:

  • Compact layers develop fissures rooted in underlying porous structures, amplifying with layer count.
  • Fissure formation is attributed to high roughness of porous layers and interfacial region coarsening.
  • Energetic plasma ion treatment of interlayers effectively smoothed interfaces and inhibited fissure formation.

Conclusions:

  • Fissure formation is an inherent issue in alternating geometry multilayer growth.
  • Energetic plasma ion treated interlayers provide an effective strategy to mitigate structural fissures.
  • The developed method is applicable to TiO2/SiO2 multilayer systems and potentially other material combinations.