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Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
Published on: September 28, 2019
Transparent Nb-doped TiO2 films with the [001] preferred orientation for efficient photocatalytic oxidation
Lina Kong1, Changhua Wang, Fangxu Wan
1Institute of Material Physics, Key Laboratory of Display Materials and Photoelectric Devices of Ministry of Education, Key Laboratory for Optoelectronic Materials and Devices of Tianjin, College of Materials Science and Engineering, Tianjin University of Technology, Tianjin 300191, China.
Abstract:
Doping and tailoring of the crystal orientation are two main strategies to improve the photocatalytic properties of TiO2 films. Herein, we introduce a novel route for obtaining Nb-doped TiO2 anatase films with the [001] preferred orientation by thermal oxidation of the [100]-oriented Nb-doped TiN film prepared by magnetron sputtering. Comprehensive analyses with X-ray diffraction, Raman scattering, high-resolution transmission electron microscopy, and X-ray photoelectron spectroscopy indicate that the proportion of high-energy (001) facets of the Nb-doped TiO2 film is more than 90% and the Nb5+ ion is successfully doped into the film without destroying the crystallinity and orientation. Moreover, the Nb5+ ion doping significantly restrains the growth of the TiO2 grains and increases the surface roughness, and consequently increases the surface-reactive sites. Therefore, the as-fabricated Nb-doped TiO2 film exhibits efficient photocatalytic oxidation performance for acetaldehyde and oleic acid decomposition under simulated solar light irradiation. Such Nb-doped TiO2 anatase films with high-reactivity (001) facet exposure may find applications in the photocatalysis and solar energy conversion fields.

