Method for enhancing the favored transverse-electric-polarized emission of an AlGaN deep-ultraviolet quantum well

An AlGaN quantum well (QW) structure of a deep-ultraviolet (UV) light-emitting diode (LED) needs to be well designed for controlling its band structure such that the heavy-hole (HH) band edge becomes lower than the split-off (SO) band edge and hence the transverse-electric (TE) polarization dominates the emission for achieving a higher light extraction efficiency. Here, we report the discovery of un-intentionally formed high-Al AlGaN nano-layers right above and below such a QW and their effects on the QW for changing the relative energy levels of the HH and SO bands. The comparison between the results of simulation study and polarization-resolved photoluminescence measurement confirms that the high-Al layers (HALs) represent the key to the observation of the dominating TE-polarized emission. By applying a stress onto a sample along its c-axis to produce a tensile strain in the c-plane for counteracting the HAL effects in changing the band structure, we can further understand the effectiveness of the HALs. The formation of the HALs is attributed to the hydrogen back-etching of Ga atoms during the temperature transition from quantum barrier growth into QW growth and vice versa. The Al filling in the etched vacancies results in the formation of an HAL. This discovery brings us with a simple method for enhancing the favored TE-polarized emission in an AlGaN deep-UV QW LED.