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Advanced Experimental Methods for Low-temperature Magnetotransport Measurement of Novel Materials
Published on: January 21, 2016
Planar Hall effect from the surface of topological insulators
A A Taskin1, Henry F Legg2, Fan Yang1
1Physics Institute II, University of Cologne, Zülpicher Str. 77, 50937, Köln, Germany.
Researchers discovered a new planar Hall effect (PHE) in topological insulator (TI) thin films. This novel effect, observed in Bi₂₋ₓSbₓTe₃, arises from magnetic field-induced resistivity changes and offers insights into TI surface properties.
Area of Science:
- Condensed Matter Physics
- Materials Science
- Spintronics
Background:
- Topological insulators (TIs) exhibit unique surface states with Dirac fermions.
- Controlling Fermi levels in TI thin films is crucial for studying surface transport.
- Previous research has not fully explored the effects of in-plane magnetic fields on TI surface properties.
Purpose of the Study:
- To investigate a novel planar Hall effect (PHE) in topological insulator thin films.
- To understand the origin of resistivity anisotropy induced by in-plane magnetic fields.
- To explore the dependence of this effect on gate voltage and its relation to the Dirac point.
Main Methods:
- Fabrication of dual-gated devices using bulk-insulating Bi₂₋ₓSbₓTe₃ thin films.
- Measurement of transport properties under varying gate voltages and in-plane magnetic fields.
- Analysis of resistivity anisotropy and its correlation with the Dirac point.
Main Results:
- Discovery of a novel planar Hall effect (PHE) originating from the TI surface.
- Observed strong gate voltage dependence of the field-induced anisotropy, with a two-peak structure near the Dirac point.
- Demonstrated that the PHE arises from time-reversal symmetry breaking by the in-plane magnetic field, affecting surface Dirac fermion backscattering.
Conclusions:
- The novel PHE in TI thin films is a consequence of anisotropic lifting of protection against backscattering for surface Dirac fermions.
- This PHE serves as a valuable tool for analyzing and manipulating the topological protection of TI surfaces.
- The findings contribute to a deeper understanding of quantum transport phenomena in topological materials.
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